| 摘要 |
A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, a backfill gas feed arranged in the article support for feeding backfill gas to a backside of the article when supported by the article support, and a clamp for clamping the article against the article support during projection. According to one aspect of the invention, the apparatus includes a controller for controlling the clamp and/or the backfill gas feed pressure so as to release the clamp prior to reducing the backfill gas feed pressure.
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