发明名称 Method of using micro-contact imprinted features for formation of electrical interconnects for substrates
摘要 An imprinting stamp to imprint an opening in a material layer in which the imprint stamp has a coating of a seed material. The seed material is transferred onto the surface within the opening to operate as a seed for filling the opening. In one embodiment, low surface energy material is used as a passivation layer between the imprinting surface and the seed coating to reduce adhesion during micro-contact transfer of the seed into the opening. The imprinting stamp is used to form trenches and via openings for formation of electrical interconnects.
申请公布号 US2004187310(A1) 申请公布日期 2004.09.30
申请号 US20030403608 申请日期 2003.03.31
申请人 GURUMURTHY CHARAN 发明人 GURUMURTHY CHARAN
分类号 H01L21/48;H01L21/768;H05K3/10;H05K3/20;(IPC1-7):H05K3/20 主分类号 H01L21/48
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