| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a discharge plasma treatment apparatus having a roller electrode and a plane electrode capable of enhancing cleaning ability on the cleaning of a substrate such as ITO up to the utilizable level in the industry. <P>SOLUTION: The discharge plasma treatment apparatus is provided with the roller electrode 1 and the plane electrode 2 opposite to the roller electrode 1, forms discharge plasma by applying an electric field between the roller electrode 1 and the plane electrode 2 and performs cleaning treatment of the substrate S by using the discharge plasma. Therein, diameter D of the roller electrode 1 is made to be ≥50mm and <2000mm and the ratio D/d of the diameter D of the roller electrode and a distance d between the electrodes is specified to be ≥25 and <900. Thereby, the plasma discharge is stabilized and the rate of cleaning treatment of the substrate S is enhanced. <P>COPYRIGHT: (C)2004,JPO |
