发明名称 |
SYSTEM FOR SUPPLYING CLEANING LIQUID |
摘要 |
PURPOSE: To provide a cleaning liquid supplying system for suitably exhausting a cleaning liquid while using it carefully. CONSTITUTION: The cleaning liquid used in a first cleaning station is sent to a spent liquid tank 2 through a sending pipe 12. The spent cleaning liquid in the tank 2 is sent to a second cleaning station through a supply pipe 21 and used for cleaning the edge part of a substrate or the inside of a cup. The cleaning liquid used in the second cleaning station is sent to another spent liquid tank 3 through a return pipe 30 and a pipe 32 branched from the pipe 30 and recovered.
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申请公布号 |
KR20020019406(A) |
申请公布日期 |
2002.03.12 |
申请号 |
KR20010054068 |
申请日期 |
2001.09.04 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
KOSHIYAMA JUN;SHIMAI FUTOSHI;TAIRA YASUMITSU |
分类号 |
B08B3/04;B08B3/08;H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
B08B3/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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