发明名称 METHOD OF EXPOSING THERMORESIST
摘要 PROBLEM TO BE SOLVED: To form an image of high resolution with a low-contrast optical apparatus by using a resist that is not governed by the reciprocity principle. SOLUTION: This low-contrast optical apparatus containing a lowcontrast linear light wave 11 can be used to form high-resolution patterns by using a thermoresist 9, in place of a photoresist and by using multiple exposure on a same area, referably by exposing at each exposure patterns having different specified shapes 1, 3, a respectively. In the case of using the thermoresist 9, since the generated stray heat is dissipated during the interval between each exposure, stray light in the process of forming each specified shape 1, 3 will not be additive. This method is particularly useful to form images in thermoresist 9 using UV light with respect to the manufacture of integrated circuits.
申请公布号 JP2001155982(A) 申请公布日期 2001.06.08
申请号 JP19990331454 申请日期 1999.11.22
申请人 CLEO SRL 发明人 GELBART DANIEL
分类号 H01L21/027;G03F7/20;(IPC1-7):H01L21/027 主分类号 H01L21/027
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