| 摘要 |
PURPOSE:To obtain a stepper wherein, in a transfer opration in a step-and-repeat manner, it is possible to restrain that a resist is bubbled at a wafer stage part on the resist on the surface of a wafer whose periphery has been exposed in advance. CONSTITUTION:A light-shielding member 6 which shields an edge part on a wafer 2 from exposure light is installed on the wafer mounting face of a stage 3 which is moved two-dimensionally, in which the wafer 2 is mounted on its surface and which is moved in a definite size in a step-and-repeat operation. |
