| 摘要 |
<p>A gas cleaning system (1) for separating gaseous pollutants, such as hydrochloric acid, comprises a contact reactor (4), and a dust separator (6). The gas cleaning system (1) further comprises a hydrochloric acid measurement device (42) and a humidity measurement device (44), which is operative for the purpose of measuring the relative humidity influencing the handling properties of the particulate absorbent material. A control system (40) controls at least one operating parameter for the purpose of adjusting the hydrochloric acid concentration in the cleaned process gases (14). At least one control device (46, 50) is operative for the purpose of controlling said at least one operating parameter in such a manner that the hydrochloric acid concentration in the cleaned process gases (14) is adjusted with respect to a hydrochloric acid reference value, and that, simultaneously, said relative humidity is adjusted with respect to a relative humidity reference value.</p> |
