Projection lens for projection exposure system for imaging distortion correcting reticle on wafer to manufacture e.g. micro-structured component, has optical components, where lens distortion is varied around specific percent of resolution

摘要

The lens (128) has a set of optical components for defining an optical path, where an object (130) on an image field is imaged by the optical components. The lens exhibits distortion within the image field in a direction. The distortion exceeds a threshold value of 20 percent of maximum achievable resolution of the lens and is varied along another direction around a maximum value of plus or minus 10 percent of the achievable resolution, where the latter direction runs transverse to the former direction. The distortion with deviation of 5 percent of the achievable resolution is compensated. Independent claims are also included for the following: (1) a lithography method for manufacturing micro or nano-structured components (2) a method for manufacturing a reticle for microlithography.