| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition suitable for forming a thick film. SOLUTION: The photosensitive resin composition comprises: a siloxane polymer (A) containing a polymerizable group and polymerizing by light irradiation; a terminal-modified siloxane compound (B); and a polymeric initiator (C). COPYRIGHT: (C)2011,JPO&INPIT
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