发明名称 METAL SPUTTERING TARGET WITH STRAIN HARDENED FLANGE
摘要 PURPOSE: A metal sputtering target in which a flange is strengthened with the strain hardening is provided to securely connect a metal sputtering target to a sputtering apparatus. CONSTITUTION: A metal sputtering target in which a flange is strengthened with the strain hardening comprises a main body(21) and a flange(22). A joint hole(23) is formed on the flange. The shape of the flange part of the sputtering target is formed roughly. After the strain hardening is raised in the flange part, the cutting process is performed.
申请公布号 KR20100077351(A) 申请公布日期 2010.07.08
申请号 KR20080135268 申请日期 2008.12.29
申请人 APPLIED SCIENCE CORP. 发明人 SONG, JERNG SIK
分类号 C21D7/00;C21D9/00;C23C14/34 主分类号 C21D7/00
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