| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus that can avoid stress guided by particles and heat in a substrate and can improve precision of pattern transcription. <P>SOLUTION: This lithographic apparatus comprises a support structure MT connected with a primary positioner PM, which is configured to support a lighting system (illuminator) IL configured to adjust radiation beam B and a patterning device MA, and also to correctly position the patterning device according to a specific parameter; a substrate table WT that can connect with a secondary positioner PW, which is configured to correctly position the substrate W according to a specific parameter; and a projection system PS that is configured to project a pattern given to the radiation beam B by the patterning device MA to the target portion C of the substrate W. <P>COPYRIGHT: (C)2008,JPO&INPIT |
