Methods and devices for lithography

摘要

A method is described for characterising (200) lithographic processing of a device (152). The method typically is performed using a lithographic processing system (100) and applying a reticle (132). Lithographic processing of a device typically is characterised by focus conditions, a set of selectable lithographic processing system parameter values and selectable reticle parameter values. The method for characterising comprises receiving (210, 220) values for said lithographic processing system parameters and for said reticle parameters and receiving (230) focus conditions for said lithographic processing characterised by said selected values, said focus conditions allowing separation of image performance effects due to lithographic processing system aberrations and image performance effects due to reticle shadowing effects. The method furthermore comprises determining (240) image performance effects due to lithographic processing system aberrations and said image performance due to reticle shadowing effects. Furthermore, a test kit for performing a method for characterising and lithographic processing devices such as a lithographic processing system or a reticle adapted using the method for characterising is described.