| 摘要 |
<p>A development apparatus is provided with a board holding part, which holds a board substantially horizontal, with a resist film on an upper side; a development nozzle for supplying a developer on an upper plane of the board held by the board holding part; and a liquid flow suppressing member, which has a mesh, passes the developer supplied from the development nozzle through openings of the mesh, and forms a liquid film of the developer between the mesh and the board. The mesh has sizes equivalent to those of the board in a two-dimensional flat view field or larger, with a multitude of openings, and is hydrophilic to the developer. The development apparatus is also provided with a moving mechanism, which movably supports the liquid flow suppressing member, permits the mesh to face the resist film on the board, and further, brings the mesh into contact with the surface of the liquid film of the developer or impregnates the mesh in the liquid film.</p> |
