SHOWER HEAD STRUCTURE HAVING DISTRIBUTION PLATE AND ROTATING IMPELLER ON CHEMICAL VAPOR DEPOSITION SYSTEM

摘要

PURPOSE: The shower head structure having a distribution plate and rotating impeller on chemical vapor deposition system is provided to shorten a processing period by dispersing rapidly and uniformly the gas within the showerhead. CONSTITUTION: The showerhead structure having a distribution plate and rotating impeller on CVD system includes a plurality of distribution plates(3,4,5) and a rotating impeller. The distribution plates(3,4,5) are installed in the showerhead. The rotating impeller is used for controlling the flow of gas within the showerhead. A rotary wing is installed in the shower head in order to disperse uniformly the gas into the shower head and accelerate the flow of gas in the shower head.