| 摘要 |
The device for adjusting or tuning a beam-generating apparatus (2) in particular in the manufacture of nano-structures comprises a control module (40) provided for the memory-storage of characteristics desired for the focused particle beam (14) as determined by the operator, the determination of the values of the adjustment parameters of the apparatus as a function of the characteristics and the storage of the values, and assigning the stored values to the adjustment parameters. The control module (40) also serves to measure either permanently or periodically when the focused particle beam (14) interacts with a target in the form of a substrate (18) and to determine the characteristics of the beam, to compare the determined characteristics with the stored characteristics, and in the case when one or more of the characteristics falls outside a predefined amplitude interval to modify the adjustment parameters and/or to inform the operator. The charged particles are ions, for example the gallium ions, and the apparatus (2) comprises a source of ions (4), for example of the liquid metal ion source (LMIS) type, a system for accelerating (6) the ions, and a system for focusing (10) the ions in the form of electrostatic optics/lensing. The apparatus is designed for the manufacture of a structure in the substrate (18), in particular of a nano-structure, and the focused ion beam can erode the substrate. The characteristics of the focused ion beam (14) include the size and the current density of the ion beam. The control module (40) implements the following manufacturing steps: forming a test print as a marker in conformity with a reference digital print stored in the memory, digitizing the test print, comparing the digitized test print with the reference test print, and in the case of a difference modifying at least one of the adjustment parameters and repeating the steps until obtaining a suitable adjustment of the apparatus. If one or more of the parameters falls outside the predefined amplitude interval centered on the stored parameter, the measured parameter is modified until it falls within the interval. In the case of instability of at least one parameter the manufacturing process is interrupted and the operator is informed and/or the apparatus calibrated. The calibration of the apparatus is carried out by forming a test print in a zone which is not used for the formation of a nano-structure. The adjustment parameters include the emission current of the ion source (4), the energy of ions, the focusing of the ion beam, the amplitude of the field of writing on the substrate (18), the correction for astigmatism, and the distance between the apparatus and the substrate. |
