发明名称 |
CONTROLLED-STRESS STABLE METALLIZATION FOR ELECTRONIC AND ELECTROMECHANICAL DEVICES |
摘要 |
A method of forming a thin film metallization layer having a predetermined residual stress and a predetermined sheet resistance and force measuring devices formed using the methods. |
申请公布号 |
EP1186011(A1) |
申请公布日期 |
2002.03.13 |
申请号 |
EP20000939853 |
申请日期 |
2000.06.14 |
申请人 |
HONEYWELL INTERNATIONAL INC. |
发明人 |
GOLECKI, ILAN |
分类号 |
B81B3/00;B81C1/00;G01L1/18;G01P15/08;G01P15/097;G01P15/10;H01L21/285;H01L21/3205 |
主分类号 |
B81B3/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|