发明名称 |
Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same |
摘要 |
Disclosed are a phosphor pattern which comprises a substrate having unevenness and a phosphor layer formed on the inner surface of a concave portion of the substrate, wherein the phosphor pattern thickness ratio (x)/(y) satisfies a range of 0.1 to 1.5, where when the length from the bottom of the concave portion to the top of a convex portion is L (mum), (x) is a thickness of the phosphor pattern formed on an uneven wall surface at a position of 0.9xL from the bottom of the concave portion toward the top of the convex portion, and (y) is a thickness of the phosphor pattern formed on the uneven wall surface at a position of 0.4xL from the bottom of the concave portion toward the top of the convex portion, and processes for preparing the same.
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申请公布号 |
US2002018946(A1) |
申请公布日期 |
2002.02.14 |
申请号 |
US20010927548 |
申请日期 |
2001.08.13 |
申请人 |
NOJIRI TAKESHI;TSUIKI HIDEYASU;TANAKA HIROYUKI;WADA YUMIKO;TAI SEIJI;TANNO SEIKICHI;KAKUMARU HAJIME;SATO KAZUYA;KIMURA NAOKI;MUKAI IKUO |
发明人 |
NOJIRI TAKESHI;TSUIKI HIDEYASU;TANAKA HIROYUKI;WADA YUMIKO;TAI SEIJI;TANNO SEIKICHI;KAKUMARU HAJIME;SATO KAZUYA;KIMURA NAOKI;MUKAI IKUO |
分类号 |
H01J17/49;G03F1/10;G03F1/56;G03F7/00;H01J9/227;(IPC1-7):G03C1/72;H01J29/32 |
主分类号 |
H01J17/49 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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