| 发明名称 |
Exposure apparatus, coating/developing system, device manufacturing system, device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method |
| 摘要 |
The interior of a port mechanism for exchanging a wafer between a coating/developing system and an exposure apparatus is evacuated, and a predetermined atmospheric gas is introduced. In loading/unloading a wafer into/from the exposure apparatus, the wafer is heated/cooled as needed.
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| 申请公布号 |
US2002011207(A1) |
申请公布日期 |
2002.01.31 |
| 申请号 |
US20010864309 |
申请日期 |
2001.05.25 |
| 申请人 |
UZAWA SHIGEYUKI;TSUKAMOTO IZUMI |
发明人 |
UZAWA SHIGEYUKI;TSUKAMOTO IZUMI |
| 分类号 |
G03F7/38;G03F7/20;H01L21/00;H01L21/027;H01L21/677;(IPC1-7):B05C11/00 |
主分类号 |
G03F7/38 |
| 代理机构 |
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