| 摘要 |
PROBLEM TO BE SOLVED: To enable a projection aligner to be improved in resolution by a method wherein a pupil filter is prescribed in transmittance and illuminance. SOLUTION: A projection aligner projects a pattern on a reticule 1 onto a wafer 3 for exposure through a projection lens 2. A pupil filter 5 is provided around the center of the pupil face 4 of the projection lens 2. A pattern on the reticule 1 is a contact hole pattern that is a kind of a punched pattern. The pupil filter 5 is possessed of a light shading radius R 0. 6 to 0. 8 at an NA ratio and transmittance T 0.1 to 5% corresponding to a contact hole pattern. An illuminating system illuminates a pattern at exposureσof 0.6 to 0.9. By this setup, not all but a part of a 0-order component of a micro hole pattern diffracted light is shielded. A 0-order component of a large hole diffracted light or a dense-hole diffracted light is not all but partially shielded.
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