| 摘要 |
PROBLEM TO BE SOLVED: To obtain a simple manufacturing method by which a microlens of <=10μm in diameter is obtd. SOLUTION: A silicon wafer 1 is prepared, a resist 3 having opening 2 is formed thereon and etching is performed by the use of this resist, thereby forming a concave-shaped marker 4 on the surface of the silicon wafer. Thereafter, the microlens is formed corresponding to the concave-shaped marker 4 by depositing a quartz film 5 on the silicon wafer 1 by the use of a plasma chemical vapor growth device in which a substrate stage served as an electrode is arranged in parallel with an electrically ground electrode within a chamber.
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