PLASMA DEPOSITION EQUIPMENT AND METHOD OF FABRICATING AMORPHOUS CARBON THIN FILM CONTAINING HYDROGEN USING THE SAME

摘要

PURPOSE: Method of fabricating amorphous carbon thin film containing hydrogen using plasma deposition equipment is provided to improve a deposition speed and uniformity of a ion beam. CONSTITUTION: The method of fabricating amorphous carbon thin film containing hydrogen using plasma deposition equipment comprises the steps of: transforming a electrode of plasma deposition equipment into a electrode having a net shape to facilitate mobility of electron; generating a plasma with wanted density using a low cost DC(Direct Current) power supply under low pressure as by increasing ionization rate of a source gas; and maintaining the plasma uniformly in a stable state. As a result, Uniformity of the amorphous thin film containing the hydrogen is increased.