| 摘要 |
<p>A glass material having a main surface and including SiO2 in the components thereof is prepared (S10). First free abrasive grains are supplied between the main surface of the glass material and a first polishing pad, and the main surface of the glass material is mechanically polished using the first polishing pad (S15). Then, second free abrasive grains differing from the first free abrasive grains are supplied between the main surface of the glass material and a second polishing pad, and the main surface of the glass material is chemically-mechanically polished using the second polishing pad (S16). Then, third free abrasive grains are supplied between the main surface of the glass material and a third polishing pad, and the main surface of the glass material is polished using the third polishing pad (S17).</p> |
