PHYSICAL VAPOR DEPOSITION CHAMBER HAVING A ROTATABLE SUBSTRATE PEDESTAL,申请号EP20050817966-传众专利搜索

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发明名称	PHYSICAL VAPOR DEPOSITION CHAMBER HAVING A ROTATABLE SUBSTRATE PEDESTAL
摘要
申请公布号	EP1848838(A4)	申请公布日期	2009.06.03
申请号	EP20050817966	申请日期	2005.11.07
申请人	APPLIED MATERIALS, INC.	发明人	LAVITSKY, ILYA;ROSENSTEIN, MICHAEL;YOSHIDOME, GOICHI;WANG, HOUGONG;LIU, ZHENDONG;YE, MENGQI
分类号	C23C14/34;C23C14/50	主分类号	C23C14/34
代理机构		代理人
主权项
地址

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