| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist stripping and cleaning device, etc. which can prevent unevenness caused by adhering and drying scatterings of pure water on a substrate after being rinsed. SOLUTION: A rinse tub 40 contains rinse sprays 42, 44 and a drain-off air knife 43. A rinse 49 is sprayed to a substrate 100 by the spray 42, and the rinse 49 is drained off by the air knife 43. After the drain-off, a mist-like rinse 49 is sprayed from the rinse spray 44 to the substrate 100. In a state of having the rinse 49 sprayed by the spray 44, the substrate 100 is transferred to a pure water replacement tub 50. The pure water replacement tub 50 contains a pure water spray 52, a backflow-proof air knife 51, and a scattering-proof cover 55. The scattering-proof cover 55 ranges from an inlet 3 of the pure water replacement tub 50 to the space just before the pure water spray 52. The backflow-proof air knife 51 is provided at an opening of the scattering-proof cover 55. COPYRIGHT: (C)2007,JPO&INPIT
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