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发明名称
Ein strahlungsempfindliches Resistmaterial und ein dieses Resistmaterial verwendendes Verfahren zur Herstellung einer Vorrichtung
摘要
申请公布号
DE60001680(D1)
申请公布日期
2003.04.24
申请号
DE2000601680
申请日期
2000.02.28
申请人
LUCENT TECHNOLOGIES INC., MURRAY HILL;ARCH SPECIALTY CHEMICALS, INC.
发明人
GABOR, ALLEN H.;HOULIHAN, FRANCIS MICHAEL;NALAMASU, OMKARAM
分类号
C08K5/00;C08K5/08;C08K5/32;C08L25/18;C08L33/08;C08L33/10;C08L45/00;C08L101/02;G03F7/004;G03F7/039;G03F7/40;H01L21/027;(IPC1-7):G03F7/004
主分类号
C08K5/00
代理机构
代理人
主权项
地址
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