Ein strahlungsempfindliches Resistmaterial und ein dieses Resistmaterial verwendendes Verfahren zur Herstellung einer Vorrichtung,申请号DE2000601680-传众专利搜索

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发明名称	Ein strahlungsempfindliches Resistmaterial und ein dieses Resistmaterial verwendendes Verfahren zur Herstellung einer Vorrichtung
摘要
申请公布号	DE60001680(D1)	申请公布日期	2003.04.24
申请号	DE2000601680	申请日期	2000.02.28
申请人	LUCENT TECHNOLOGIES INC., MURRAY HILL;ARCH SPECIALTY CHEMICALS, INC.	发明人	GABOR, ALLEN H.;HOULIHAN, FRANCIS MICHAEL;NALAMASU, OMKARAM
分类号	C08K5/00;C08K5/08;C08K5/32;C08L25/18;C08L33/08;C08L33/10;C08L45/00;C08L101/02;G03F7/004;G03F7/039;G03F7/40;H01L21/027;(IPC1-7):G03F7/004	主分类号	C08K5/00
代理机构		代理人
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