发明名称 CONTROLLABLY MONITORING AND REDUCING A MATERIAL
摘要 The instant invention provides a vibration insensitive method of precisely polishing an object. The method includes the steps of providing an object to be polished, applying a conductive material to a non-electrical current conductive surface of the object (alternatively, if the object conducts electric current, the object should b e coated with a thin layer of non-electric current conductive material using methods known t o those skilled in the art), removing a portion of the object and the conductive material through polishing, and measuring an electric current flowing through the conductive material to monitor a progress of the polishing. Advantageously, the method does not require the polishing process to be interrupted to monitor the progress of the polishing . In fact, since the progress is measured as a function of resistance/electrical current, the progress is measured with an accuracy and precision related to each individual turn of a polishing pad. Advantageously, the instant method is remarkably vibration insensitive and is practical for the simultaneous, automatic, and precise, polishing of monolithic objects.
申请公布号 CA2328274(A1) 申请公布日期 2002.04.11
申请号 CA20002328274 申请日期 2000.12.11
申请人 JDS UNIPHASE INC. 发明人 SAULNIER, ERIC;RABINSKI, GUENADI
分类号 B24B37/04;B24B49/10;(IPC1-7):B24B49/10;B23H9/06 主分类号 B24B37/04
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