METHOD FOR CLEANING CHEMICAL VAPOR DEPOSITION CHAMBER

摘要

PURPOSE: A method for cleaning a chemical vapor deposition(CVD) chamber is provided to eliminate a metal pollutant from the CVD chamber, the metal pollutant being capable of contaminating succeeding CVD processes. CONSTITUTION: A method for cleaning a chemical vapor deposition(CVD) chamber comprises the steps of: inducing mixing gas including medium gas and cleaning gas into the chamber; exciting the mixing gas so that plasma is formed in the chamber; and cleaning the chamber by the plasma for a predetermined period of time.