发明名称 DRY DEVELOPING METHOD OF PHOTOSENSITIVE MATERIAL
摘要 PURPOSE:To improve the workability in a dry developing method by oscillating a pigment relatively with the film surface of a photosensitive material and sticking the pigment to the surface of the photosensitive material. CONSTITUTION:A photosensitive material of which the power to receive a pigment when exposed changes is exposed imagewise and if necessary the image part is subjected to a treatment to increase the pigment accepting power and thereafter the pigment is stuck thereto. The photosensitive material after image exposure is first placed in such a way that the film surface faces downward in a vat laid with the pigment and the photosensitive material is pressed to the pigment layer if necessary in the above-mentioned method. The pigment is then oscillated relatively with the film surface of the photosensitive material to stick the pigment to the surface of the photosensitive material and thereafter the pigment sticking to the non-image part of the photosensitive material is removed.
申请公布号 JPS60447(A) 申请公布日期 1985.01.05
申请号 JP19830108859 申请日期 1983.06.16
申请人 ARIGA SHIYASHINKAN:KK 发明人 TOMITA SEIJI
分类号 G03C5/00;G03C7/00;G03C8/40;G03F7/26;G03F7/28;(IPC1-7):G03C5/24 主分类号 G03C5/00
代理机构 代理人
主权项
地址