| 摘要 |
PURPOSE: To lower pressure sensitivity and to prevent the generation of pressure marks at the time of use in rapid processing by incorporating specific tabular grains contg. colloidal silica as protective film colloid. CONSTITUTION: This silver halide emulsion contains the tabular grains contg. the colloidal silica sol as the protective colloid. The tabular grains have an average grain thickness of <=0.3μm, an average aspect ratio higher than 12:1 and the degree of covering power by the silica sol grains within a range of 50 to 2000%. Further, the photosensitive tabular silver halide grains covered with the silica grains has preferably the degree of the covering power within a range of 75 to 500%. The grains having the silica as the protective colloid preferably have an average grain thickness of <=0.2μm. The total projection area of the tabular grains is preferably at least 70% and the total projection area of at least 90% is mode preferable. The tabular grains covered with the silica grains is preferably a silver halide compsn.
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