发明名称 Crystalline inclusion compounds of silicon dioxide, process for their preparation, and their use
摘要 The invention relates to crystalline inclusion compounds of silicon dioxide which have a structure analogous to that of the gas hydrates of structural type II and the formula 136[(Si1-xTx)] x (24-y)M, in which T is an atom tetrahedrally coordinated by oxygen, x has a numerical value of </= 0.1, y a numerical value of 0 </= y </= 24 and M denotes atoms, molecules and/or ions having kinetic Lennard-Jones diameters sigma </= 9 ANGSTROM in accordance with Patent Application P 3128988.6 in which M denotes atoms, molecules and/or ions having kinetic Lennard-Jones diameters of 11 ANGSTROM , and to the process for their preparation, in which basic, neutral and/or acidic SiO2-containing solutions are heated to temperatures above 120 DEG C at superatmospheric pressures, and to their use as agent for the absorption and storage of atoms, molecules and/or ions having kinetic Lennard-Jones diameters sigma </= 11 ANGSTROM .
申请公布号 DE3201752(A1) 申请公布日期 1983.09.08
申请号 DE19823201752 申请日期 1982.01.21
申请人 LIEBAU,FRIEDRICH,PROF.DR. 发明人 GERKE,HORST,DR.;GIES,HERMANN,DIPL.-CHEM.;LIEBAU,FRIEDRICH,PROF.DR.
分类号 C01B3/00;C01B33/00;C01C1/04;G21F9/02 主分类号 C01B3/00
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