| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of an electro-optic device capable of exposing and forming a resist pattern for flattening a global step by a photo mask independent of a region, a circuit configuration or the like having the global step. <P>SOLUTION: The electro-optic device is manufactured by the manufacturing method including processes of: forming a third interlayer insulation film 43 on the surface of a pixel circuit element layer 7a and a peripheral circuit element layer 7b formed on a substrate 10 (a); polishing the surface of the third interlayer insulation film 43 (b) to form a resist 65 (c); exposing a pattern to the resist 65 by means of an exposure system having a focal depth smaller than twice a step d on the surface of the resist 65 while being focused on a height corresponding to an upper level of the step of the resist 65 (d); then developing the pattern to remove it and etching the third insulation film 43 using the resist 65 having the pattern formed as a mask, and thereafter peeling the resist 65. <P>COPYRIGHT: (C)2008,JPO&INPIT |
