首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
VORRICHTUNG ZUM REPARIEREN VON DEFEKTEN FLUG- UND FAHRZEUGLUFTSCHLAEUCHEN ALLER ART.
摘要
申请公布号
DE1752312(U)
申请公布日期
1957.09.12
申请号
DE195700R4678U
申请日期
1957.06.08
申请人
FRIEDRICH RAUSCHER
发明人
FRIEDRICH RAUSCHER
分类号
主分类号
代理机构
代理人
主权项
地址
您可能感兴趣的专利
半导体装置及其形成方法;SEMICONDUCTOR DEVICE AND FABRICATIONS THEREOF
带有自对准有源接触的基于高密度沟槽的功率ＭＯＳＦＥＴ及其制备方法;HIGH DENSITY TRENCH-BASED POWER MOSFETS WITH SELF-ALIGNED ACTIVE CONTACTS AND METHOD FOR MAKING SUCH DEVICES
形成于半导体基板之鳍片特征部上之电晶体的隔离组件;ISOLATION COMPONENTS FOR TRANSISTORS FORMED ON FIN FEATURES OF SEMICONDUCTOR SUBSTRATES
使用沟道自对准矽化物布线层之方法;METHODS OF USING A TRENCH SALICIDE ROUTING LAYER
增强型氮化镓电晶体元件;ENHANCEMENT MODE GALLIUM NITRIDE BASED TRANSISTOR DEVICE
薄膜发光二极体装置;THIN FILM LIGHT EMITTING DIODE DEVICE
堆叠式封装件与其制造方法;STACKED PACKAGE DEVICE AND MANUFACATURING METHOD THEREOF
电子元件封装之制法;METHOD FOR FORMING ELECTRONIC COMPONENT PACKAGE
用以接合裸晶片晶粒之方法;METHOD FOR BONDING BARE CHIP DIES
半导体装置;SEMICONDUCTOR DEVICE
改善封装及３Ｄ积体电路的底部塡充制程的系统与方法;SYSTEM AND METHOD TO IMPROVE PACKAGE AND 3DIC YIELD IN UNDERFILL PROCESS
藉由活化非活性氧沉淀核制造高沉淀密度晶圆;PRODUCTION OF HIGH PRECIPITATE DENSITY WAFERS BY ACTIVATION OF INACTIVE OXYGEN PRECIPITATE NUCLEI
基板处理装置及半导体装置的制造方法
于通孔底部具有自形成阻障层之半导体设备;SEMICONDUCTOR DEVICE HAVING A SELF-FORMING BARRIER LAYER AT VIA BOTTOM
用于化学机械硏磨站维护之方法及化学机械硏磨站;METHOD FOR CHEMICAL MECHANICAL POLISHING (CMP) STATION MAINTENANCE AND CHEMICAL MECHANICAL POLISHING (CMP) STATION
半导体元件之制造方法、半导体元件;METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
触控电极装置;TOUCH ELECTRODE DEVICE
用于测试及蚀刻基板之多功能设备及包含其之基板处理设备;MULTI-FUNCTIONAL APPARATUS FOR TESTING AND ETCHING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
X光管电源装置、具该装置之电源系统及其操作方法;POWER APPARATUS OF X-RAY TUBE, POWER SYSTEM WITH THE POWER APPARATUS, AND METHOD OF OPERATING THE SAME
使用导线架的卷绕型固态电解电容器封装结构及其制作方法;WINDING-TYPE SOLID ELECTROLYTIC CAPACITOR PACKAGE STRUCTURE USING A LEAD FRAME AND METHOD OF MANUFACTURING THE SAME
