| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas injector capable of optimizing the setting of a plurality of injectors for each individual step, process, and/or stage in the working recipe of substrate treatment. SOLUTION: A substrate treatment device has computer controlled injectors (18A to 18E). A computer (22) is configured so as to adjust a plurality of the injectors (18A to 18E) during the deposition of a graded layer between depositions of two different layers, or between deposition and reaction chamber clean steps. COPYRIGHT: (C)2006,JPO&NCIPI
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